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Product Concept |
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New Techonology No.1 |
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New Techonology No.2 |
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New Techonology No.3 |
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Reduction of pattrern noise level |
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Performance |
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Sidewall Design |
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Available Sizes and Specifications |
Reduction of pattern noise level
Optimization of the pattern arrangement
Pattern arrangement of G02plus is sifted by 1/2pitch for reduction of pattern noise level.
